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专利名称：Processing information management in a
plasma processing tool
发明人：Chad R. Weetman申请号：US11061414申请日：20050218
公开号：US20060187713A1公开日：20060824
专利附图：
摘要：A computer-implemented method for managing substrate processing data.Substrate process data is acquired while a substrate is processed in a plasma-processingchamber of a cluster tool. The method includes receiving meta-data that identifies at
least one of an identification of the substrate and a process. The method further includesreceiving from transducers process data streams, each of the process data streamspertaining to a process parameter being monitored. Individual data items in each of theprocess data streams are being collected in accordance to one of a first methodologyand a second methodology. The first methodology represents data collection that isperiodic in time. The second methodology represents data collection that happens whenpredefined events occur. The method also includes storing individual data itemsassociated with process data streams in a single file. The single file stores only datapertaining to a single recipe used to process the substrate.
申请人：Chad R. Weetman
地址：Newark CA US
国籍：US
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