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专利名称：Structure and method for fabrication for a
lighting device
发明人：George Valliath申请号：US099215申请日：20010806
公开号：US20030026310A1公开日：20030206
专利附图：
摘要：A lighting device suitable for low power applications, such as backlighting aliquid crystal display (LCD), includes plural light emitting components and photovoltaicelements formed on a monocrystalline silicon substrate. To fabricate the lighting device,
high quality epitaxial layers of monocrystalline materials can be grown overlying thesilicon substrate by forming a compliant substrate for growing the monocrystallinelayers. One way to achieve the formation of a compliant substrate includes first growingan accommodating buffer layer on a silicon wafer. The accommodating buffer layer is alayer of monocrystalline oxide spaced apart from the silicon wafer by an amorphousinterface layer of silicon oxide. The amorphous interface layer dissipates strain andpermits the growth of a high quality monocrystalline oxide accommodating buffer layer.The accommodating buffer layer is lattice matched to both the underlying silicon waferand the overlying monocrystalline material layer.
申请人：MOTOROLA, INC.
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