专利内容由知识产权出版社提供
专利名称：NANOIMPRINT LITHOGRAPHY FORMATION
OF FUNCTIONAL NANOPARTICLES USINGDUAL RELEASE LAYERS
发明人：SINGH, Vikramjit,XU, Frank Y.,SREENIVASAN,
Sidlgata V.
申请号：EP118304.8申请日：20111104公开号：EP2635522A2公开日：20130911
摘要：Functional nanoparticles may be formed using at least one nanoimprintlithography step. In one embodiment, sacrificial material may be patterned on amultilayer substrate including one or more functional layers between removable layersusing an imprint lithography process. At least one of the functional layers includes afunctional material such as a pharmaceutical composition or imaging agent. The patternmay be further etched into the multilayer substrate. At least a portion of the functionalmaterial may then be removed to provide a crown surface exposing pillars. Removing theremovable layers releases the pillars from the patterned structure to form functionalnanoparticles such as drug or imaging agent carriers.
申请人：Molecular Imprints, Inc.,Board of Regents, The University of Texas System
地址：1807 West Braker Lane, Building C- 100 Austin, Texas 78758-3605 US,201 West7th Street 7th Floor Austin, TX 78701 US
国籍：US,US
代理机构：Sutto, Luca
更多信息请下载全文后查看
